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JOURNALS
2016
Beneficial effect of hydrogen in aluminum oxide deposited through the atomic layer deposition method on the electrical properties of an indium–gallium–zinc oxide thin-film transistor
Journal of Information Display
Yunyong Nam, Hee-Ok Kim, Sung Haeng Cho, Chi-Sun Hwang, Taeho Kim, Sanghun Jeon and Sang-Hee Ko Park*
2014
Influence of gate dielectric/channel interface engineering on the stability of amorphous indium gallium zinc oxide thin-film transistors
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
Sung Haeng Cho, Min Ki Ryu, Hee-Ok Kim, Oh-Sang Kwon, Eun-Sook Park, Yong-Suk Roh,Chi-Sun Hwang, and Sang-Hee Ko Park
2014
Negative-Bias Light Stress Instability Mechanisms of the Oxide-Semiconductor Thin-Film Transistors Using In–Ga–O Channel Layers Deposited With Different Oxygen Partial Pressures
IEEE Transactions on Electron Devices
Jun Yong Bak, Shinhyuk Yang, Ho-Jun Ryu, Sang Hee Ko Park, Chi Sun Hwang, and Sung Min Yoon
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